Invention Grant
- Patent Title: Chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
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Application No.: US15994486Application Date: 2018-05-31
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Publication No.: US11302517B2Publication Date: 2022-04-12
- Inventor: Jong-hoon Park , Sukwon Jung , Hyunwoo Joo , Jaihyuk Choi , Kyungjoo Min , Wonwoong Park
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: Innovation Counsel LLP
- Priority: KR10-2017-0087963 20170711
- Main IPC: H01J37/32
- IPC: H01J37/32 ; C23C16/44 ; C23C16/505 ; H01L51/00 ; H01L51/56 ; C23C16/455 ; C23C16/509 ; C23C16/34
Abstract:
A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.
Public/Granted literature
- US20190019652A1 CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME Public/Granted day:2019-01-17
Information query
