公开(公告)号：US20220238306A1

公开(公告)日：2022-07-28

申请号：US17718047

申请日：2022-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  H01L51/56 ,  C23C16/505 ,  C23C16/455 ,  C23C16/509

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.

公开(公告)号：US20190019652A1

公开(公告)日：2019-01-17

申请号：US15994486

申请日：2018-05-31

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/505 ,  H01L51/56

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.

公开(公告)号：US11302517B2

公开(公告)日：2022-04-12

申请号：US15994486

申请日：2018-05-31

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/505 ,  H01L51/00 ,  H01L51/56 ,  C23C16/455 ,  C23C16/509 ,  C23C16/34

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.

公开(公告)号：US11214870B2

公开(公告)日：2022-01-04

申请号：US15990051

申请日：2018-05-25

Applicant: Samsung Display Co., Ltd.

Inventor： Jaihyuk Choi ,  Jong-hoon Park ,  Kyungjoo Min ,  Wonwoong Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Myungsoo Huh

IPC: C23C16/458 ,  C23C16/44 ,  H01J37/32 ,  C23C16/50 ,  H01L21/687 ,  C23C16/509 ,  C23C16/455 ,  H01R9/16 ,  H01R9/00 ,  H01L21/02

Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a bottom inner surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.

公开(公告)号：US11842883B2

公开(公告)日：2023-12-12

申请号：US17718047

申请日：2022-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/505 ,  C23C16/455 ,  C23C16/509 ,  H10K71/00 ,  C23C16/34 ,  H10K71/16

CPC classification number: H01J37/32082 ,  C23C16/4411 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/505 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32091 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32568 ,  H01J37/32577 ,  H10K71/00 ,  C23C16/345 ,  H01J2237/3321 ,  H10K71/164

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.