公开(公告)号：US20190019652A1

公开(公告)日：2019-01-17

申请号：US15994486

申请日：2018-05-31

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/505 ,  H01L51/56

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.

公开(公告)号：US20160133873A1

公开(公告)日：2016-05-12

申请号：US14811729

申请日：2015-07-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myungsoo Huh ,  Sunghun Key ,  Sungchul Kim ,  Cheollae Roh ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi

IPC: H01L51/52 ,  H01J37/32 ,  H01L51/56

CPC classification number: H01L51/5256 ,  C23C16/042 ,  C23C16/345 ,  C23C16/45565 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/3244

Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.

Abstract translation: 公开了一种显示装置及其制造方法。 显示装置包括：基板; 形成在所述基板上的显示单元; 以及形成在所述显示单元上的无机层，其中所述无机层的水蒸气透过率（WVTR）为5×10 -5 g / m 2·天以下。 用于制造显示装置的装置包括：腔室; 用于将混合气体喷射到所述室中的淋浴头; 用于从所述混合气体形成等离子体的等离子体产生单元; 面向淋浴喷头的感受器，其上安置有基底; 以及电连接到所述等离子体产生单元的电源单元，其中从所述电源单元提供给所述等离子体产生单元的电流的频率在约27MHz至约42MHz之间。

公开(公告)号：US11214870B2

公开(公告)日：2022-01-04

申请号：US15990051

申请日：2018-05-25

Applicant: Samsung Display Co., Ltd.

Inventor： Jaihyuk Choi ,  Jong-hoon Park ,  Kyungjoo Min ,  Wonwoong Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Myungsoo Huh

IPC: C23C16/458 ,  C23C16/44 ,  H01J37/32 ,  C23C16/50 ,  H01L21/687 ,  C23C16/509 ,  C23C16/455 ,  H01R9/16 ,  H01R9/00 ,  H01L21/02

Abstract: A chemical vapor deposition (CVD) system may include a chamber, a susceptor provided in the chamber to support a substrate, a gas distribution part provided over the susceptor, a first ground strap bar provided on a bottom inner surface of the chamber and electrically connected to the chamber, a second ground strap bar provided on a bottom surface of the susceptor and electrically connected to the susceptor, and a plurality of ground straps electrically connected to the first and second ground strap bars, each of the plurality of ground straps including two opposite portions that are fastened to the first and second ground strap bars, respectively.

公开(公告)号：US20170170428A1

公开(公告)日：2017-06-15

申请号：US15369663

申请日：2016-12-05

Applicant: Samsung Display Co., Ltd.

Inventor： Myungsoo Huh ,  Sungchul Kim ,  Choelmin Jang ,  Cheollae Roh ,  Jaihyuk Choi

IPC: H01L51/52 ,  H01L51/56 ,  H01L27/32 ,  H01L51/00

CPC classification number: H01L51/5253 ,  H01L27/3246 ,  H01L27/3262 ,  H01L51/0097 ,  H01L51/524 ,  H01L51/56

Abstract: Provided is a cover window includes a first layer including a polymer material, a second layer above a first surface of the first layer and including an oxide of a first metal, and an intermediate region between the first layer and the second layer, wherein the intermediate region includes the oxide of the first metal where the first metal binds to a dangling bond of oxygen of the polymer material, and the oxide of the first metal included in the second layer has a different composition ratio than the oxide of the first metal included in the intermediate region.

公开(公告)号：US11842883B2

公开(公告)日：2023-12-12

申请号：US17718047

申请日：2022-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/505 ,  C23C16/455 ,  C23C16/509 ,  H10K71/00 ,  C23C16/34 ,  H10K71/16

CPC classification number: H01J37/32082 ,  C23C16/4411 ,  C23C16/4412 ,  C23C16/45565 ,  C23C16/505 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32091 ,  H01J37/32458 ,  H01J37/32467 ,  H01J37/32568 ,  H01J37/32577 ,  H10K71/00 ,  C23C16/345 ,  H01J2237/3321 ,  H10K71/164

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.

公开(公告)号：US09722206B2

公开(公告)日：2017-08-01

申请号：US14811729

申请日：2015-07-28

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myungsoo Huh ,  Sunghun Key ,  Sungchul Kim ,  Cheollae Roh ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi

IPC: H01L33/00 ,  H01L51/52 ,  H01J37/32 ,  C23C16/04 ,  C23C16/34 ,  C23C16/455 ,  C23C16/505

CPC classification number: H01L51/5256 ,  C23C16/042 ,  C23C16/345 ,  C23C16/45565 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/3244

Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.

公开(公告)号：US11302517B2

公开(公告)日：2022-04-12

申请号：US15994486

申请日：2018-05-31

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/505 ,  H01L51/00 ,  H01L51/56 ,  C23C16/455 ,  C23C16/509 ,  C23C16/34

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.

公开(公告)号：US09806291B2

公开(公告)日：2017-10-31

申请号：US15369663

申请日：2016-12-05

Applicant: Samsung Display Co., Ltd.

Inventor： Myungsoo Huh ,  Sungchul Kim ,  Choelmin Jang ,  Cheollae Roh ,  Jaihyuk Choi

IPC: H01L51/52 ,  H01L51/00 ,  H01L51/56 ,  H01L27/32

CPC classification number: H01L51/5253 ,  H01L27/3246 ,  H01L27/3262 ,  H01L51/0097 ,  H01L51/524 ,  H01L51/56

Abstract: Provided is a cover window includes a first layer including a polymer material, a second layer above a first surface of the first layer and including an oxide of a first metal, and an intermediate region between the first layer and the second layer, wherein the intermediate region includes the oxide of the first metal where the first metal binds to a dangling bond of oxygen of the polymer material, and the oxide of the first metal included in the second layer has a different composition ratio than the oxide of the first metal included in the intermediate region.

公开(公告)号：US20170309864A1

公开(公告)日：2017-10-26

申请号：US15640945

申请日：2017-07-03

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myungsoo Huh ,  Sunghun Key ,  Sungchul Kim ,  Cheollae Roh ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi

IPC: H01L51/52 ,  H01J37/32 ,  C23C16/505 ,  C23C16/455 ,  C23C16/34 ,  C23C16/04

CPC classification number: H01L51/5256 ,  C23C16/042 ,  C23C16/345 ,  C23C16/45565 ,  C23C16/505 ,  H01J37/32091 ,  H01J37/3244

Abstract: A display device and an apparatus and method for manufacturing the same are disclosed. The display device includes: a substrate; a display unit formed on the substrate; and an inorganic layer formed on the display unit, wherein a water vapor transmission rate (WVTR) of the inorganic layer is 5×10−5 g/m2 day or less. The apparatus for manufacturing a display device includes: a chamber; a shower head for spraying a mixed gas into the chamber; a plasma generation unit for forming plasma from the mixed gas; a susceptor facing the shower head and on which a substrate is seated; and a power supply unit electrically connected to the plasma generation unit, wherein a frequency of a current supplied from the power supply unit to the plasma generation unit is between about 27 MHz and about 42 MHz.

公开(公告)号：US20220238306A1

公开(公告)日：2022-07-28

申请号：US17718047

申请日：2022-04-11

Applicant: Samsung Display Co., Ltd.

Inventor： Jong-hoon Park ,  Sukwon Jung ,  Hyunwoo Joo ,  Jaihyuk Choi ,  Kyungjoo Min ,  Wonwoong Park

IPC: H01J37/32 ,  C23C16/44 ,  H01L51/56 ,  C23C16/505 ,  C23C16/455 ,  C23C16/509

Abstract: A chemical vapor deposition apparatus includes a chamber, a susceptor supporting a substrate, a backing plate to which power is applied, a diffuser providing a deposition gas, and a first insulator. The first insulator may include a first portion covering a top surface of the backing plate, and a second portion assembled with the first portion and covering a sidewall of the backing plate.