Invention Grant
- Patent Title: Multi-function overlay marks for reducing noise and extracting focus and critical dimension information
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Application No.: US17171119Application Date: 2021-02-09
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Publication No.: US11448975B2Publication Date: 2022-09-20
- Inventor: Yu-Ching Lee , Te-Chih Huang , Yu-Piao Fang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes and Boone, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/42 ; G03F1/22 ; G03F1/24
Abstract:
An overlay mark includes a first, a second, a third, and a fourth component. The first component is located in a first region of the first overlay mark and includes a plurality of gratings that extend in a first direction. The second component is located in a second region of the first overlay mark and includes a plurality of gratings that extend in the first direction. The third component is located in a third region of the first overlay mark and includes a plurality of gratings that extend in a second direction different from the first direction. The fourth component is located in a fourth region of the first overlay mark and includes a plurality of gratings that extend in the second direction. The first region is aligned with the second region. The third region is aligned with the fourth region.
Public/Granted literature
- US20210165315A1 Multi-Function Overlay Marks for Reducing Noise and Extracting Focus and Critical Dimension Information Public/Granted day:2021-06-03
Information query
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