Invention Grant
- Patent Title: Fatigue-free bipolar loop treatment to reduce imprint effect in piezoelectric device
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Application No.: US16534330Application Date: 2019-08-07
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Publication No.: US11456330B2Publication Date: 2022-09-27
- Inventor: Chi-Yuan Shih , Shih-Fen Huang , You-Ru Lin , Yan-Jie Liao
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: H01L41/31
- IPC: H01L41/31 ; H01L27/20 ; H01L41/314 ; H01L41/09

Abstract:
In some embodiments, the present disclosure relates to a method for recovering degraded device performance of a piezoelectric device. The method includes operating the piezoelectric device in a performance mode by applying one or more voltage pulses to the piezoelectric device, and determining that a performance parameter of the piezoelectric device has a first value that has deviated from a reference value by more than a predetermined threshold value during a first time period. During a second time period, the method further includes applying a bipolar loop to the piezoelectric device, comprising positive and negative voltage biases. During a third time period, the method further includes operating the piezoelectric device in the performance mode, wherein the performance parameter has a second value. An absolute difference between the second value and the reference value is less than an absolute difference between the first value and the reference value.
Public/Granted literature
- US20210043680A1 FATIGUE-FREE BIPOLAR LOOP TREATMENT TO REDUCE IMPRINT EFFECT IN PIEZOELECTRIC DEVICE Public/Granted day:2021-02-11
Information query
IPC分类: