Invention Grant
- Patent Title: Carrier head having retainer ring, polishing system including the carrier head and method of using the polishing system
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Application No.: US16515300Application Date: 2019-07-18
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Publication No.: US11458587B2Publication Date: 2022-10-04
- Inventor: Chang-Sheng Lin , Hsin-Hsien Lu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: B24B37/30
- IPC: B24B37/30 ; B24B37/32 ; B24B37/04 ; B24B37/10 ; B24B37/20

Abstract:
Some embodiments relate to a carrier head. The carrier head includes a housing configured to enclose a wafer, wherein the housing includes a retaining ring recess configured to circumferentially surround the wafer. A retaining ring, which includes a first ring-shaped layer and a second ring-shaped layer, is disposed in the retaining ring recess. The second ring-shaped layer is disposed deeper in the retaining ring recess than the first ring-shaped layer and separates the first ring-shaped layer from a bottom of the retaining ring recess. A hardness of the second ring-shaped layer is less than a hardness of the first ring-shaped layer.
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