Invention Grant
- Patent Title: Layout pattern of magnetoresistive random access memory
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Application No.: US17006928Application Date: 2020-08-31
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Publication No.: US11489010B2Publication Date: 2022-11-01
- Inventor: Chun-Yen Tseng , Shu-Ru Wang , Yu-Tse Kuo , Chang-Hung Chen , Yi-Ting Wu , Shu-Wei Yeh , Ya-Lan Chiou , Chun-Hsien Huang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: CN202010770916.0 20200804
- Main IPC: H01L27/22
- IPC: H01L27/22 ; H01L43/02

Abstract:
A layout pattern of a magnetoresistive random access memory (MRAM) includes a substrate having a first cell region, a second cell region, a third cell region, and a fourth cell region and a diffusion region on the substrate extending through the first cell region, the second cell region, the third cell region, and the fourth cell region. Preferably, the diffusion region includes a H-shape according to a top view.
Information query
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