Invention Grant
- Patent Title: Arrays including a resin film and a patterned polymer layer
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Application No.: US15848640Application Date: 2017-12-20
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Publication No.: US11512339B2Publication Date: 2022-11-29
- Inventor: Wayne N. George , Alexandre Richez , M. Shane Bowen , Andrew A. Brown , Dajun Yuan , Audrey Rose Zak , Sean M. Ramirez , Raymond Campos
- Applicant: ILLUMINA, INC. , ILLUMINA CAMBRIDGE LIMITED
- Applicant Address: US CA San Diego; GB Cambridge
- Assignee: ILLUMINA, INC.,ILLUMINA CAMBRIDGE LIMITED
- Current Assignee: ILLUMINA, INC.,ILLUMINA CAMBRIDGE LIMITED
- Current Assignee Address: US CA San Diego; GB Cambridge
- Agency: Illumina, Inc.
- Main IPC: C09D183/06
- IPC: C09D183/06 ; C12Q1/68 ; C09D133/26 ; C08G77/14

Abstract:
An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.
Public/Granted literature
- US20180179575A1 ARRAYS INCLUDING A RESIN FILM AND A PATTERNED POLYMER LAYER Public/Granted day:2018-06-28
Information query
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