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    IMPRINTING APPARATUS
    2.
    发明申请
    IMPRINTING APPARATUS 审中-公开

    公开(公告)号：US20180178416A1

    公开(公告)日：2018-06-28

    申请号：US15847150

    申请日：2017-12-19

    申请人： Illumina, Inc. ,  Illumina Cambridge Limited

    发明人： Alexandre Richez ,  Andrew A. Brown ,  Julia Morrison ,  Wayne N. George ,  Timothy J. Merkel ,  Audrey Rose Zak

    IPC分类号： B29C33/38 ,  C09D4/00 ,  C09D133/26 ,  B29C33/40 ,  B29C59/02 ,  G03F7/00

    摘要： An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

    IMPRINTING APPARATUS
    3.
    发明申请
    IMPRINTING APPARATUS 有权

    公开(公告)号：US20220088834A1

    公开(公告)日：2022-03-24

    申请号：US17541089

    申请日：2021-12-02

    申请人： Illumina, Inc. ,  Illumina Cambridge Limited

    发明人： Alexandre Richez ,  Andrew A. Brown ,  Julia Morrison ,  Wayne N. George ,  Timothy J. Merkel ,  Audrey Rose Zak

    IPC分类号： B29C33/38 ,  C09D133/26 ,  B29C59/02 ,  G03F7/00 ,  B29C33/40

    摘要： An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.

    ARRAYS INCLUDING A RESIN FILM AND A PATTERNED POLYMER LAYER
    4.
    发明申请
    ARRAYS INCLUDING A RESIN FILM AND A PATTERNED POLYMER LAYER 审中-公开

    公开(公告)号：US20180179575A1

    公开(公告)日：2018-06-28

    申请号：US15848640

    申请日：2017-12-20

    申请人： ILLUMINA, INC. ,  ILLUMINA CAMBRIDGE LIMITED

    发明人： Wayne N. George ,  Alexandre Richez ,  M. Shane Bowen ,  Andrew A. Brown ,  Dajun M. Yuan ,  Audrey Rose Zak ,  Sean M. Ramirez ,  Raymond Campos

    IPC分类号： C12Q1/68 ,  C09D183/06 ,  C09D133/26

    摘要： An example of an array includes a support, a cross-linked epoxy polyhedral oligomeric silsesquioxane (POSS) resin film on a surface of the support, and a patterned hydrophobic polymer layer on the cross-linked epoxy POSS resin film. The patterned hydrophobic polymer layer defines exposed discrete areas of the cross-linked epoxy POSS resin film, and a polymer coating is attached to the exposed discrete areas. Another example of an array includes a support, a modified epoxy POSS resin film on a surface of the support, and a patterned hydrophobic polymer layer on the modified epoxy POSS resin film. The modified epoxy POSS resin film includes a polymer growth initiation site, and the patterned hydrophobic polymer layer defines exposed discrete areas of the modified epoxy POSS resin film. A polymer brush is attached to the polymer growth initiation site in the exposed discrete areas.

    Imprinting apparatus
    6.
    发明授权
    Imprinting apparatus 有权

    公开(公告)号：US11213976B2

    公开(公告)日：2022-01-04

    申请号：US15847150

    申请日：2017-12-19

    申请人： Illumina, Inc. ,  Illumina Cambridge Limited

    发明人： Alexandre Richez ,  Andrew A. Brown ,  Julia Morrison ,  Wayne N. George ,  Timothy J. Merkel ,  Audrey Rose Zak

    IPC分类号： B29C33/38 ,  C09D133/26 ,  B29C59/02 ,  G03F7/00 ,  B29C33/40 ,  C09D4/00 ,  B29L31/00

    摘要： An imprinting apparatus includes a silicon master having a plurality of nanofeatures defined therein. An anti-stick layer coats the silicon master, the anti-stick layer including a molecule having a cyclosiloxane with at least one silane functional group. A method includes forming a master template by: depositing a formulation on a silicon master including a plurality of nanofeatures defined therein, the formulation including a solvent and a molecule having a cyclosiloxane with at least one silane functional group; and curing the formulation, thereby forming an anti-stick layer on the silicon master, the anti-stick layer including the molecule. The method further includes depositing a silicon-based working stamp material on the anti-stick layer of the master template; curing the silicon-based working stamp material to form a working stamp including a negative replica of the plurality of nanofeatures; and releasing the working stamp from the master template.