Invention Grant
- Patent Title: Electroplating systems and methods
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Application No.: US17207566Application Date: 2021-03-19
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Publication No.: US11542617B2Publication Date: 2023-01-03
- Inventor: Lei Chen , Blair A. Smith , Haralambos Cordatos
- Applicant: Hamilton Sundstrand Corporation
- Applicant Address: US NC Charlotte
- Assignee: Hamilton Sundstrand Corporation
- Current Assignee: Hamilton Sundstrand Corporation
- Current Assignee Address: US NC Charlotte
- Agency: Locke Lord LLP
- Agent Joshua L. Jones; Gabrielle L. Gelozin
- Main IPC: C25D21/10
- IPC: C25D21/10 ; C25D5/08 ; C25D21/04 ; C25D17/02 ; C25D5/06 ; C25D3/66 ; C25D5/00 ; C25D17/00

Abstract:
An electroplating system includes an enclosure with an interior, an anode lead extending through the enclosure and into the interior, and a porous body. The porous body is supported within the interior of the enclosure for coupling an electroplating solution within the interior with a workpiece. A conduit extends through the enclosure and into the interior of the enclosure to provide a flow of nitrogen enriched air to the interior of enclosure for drying and removing oxygen from the electroplating solution.
Public/Granted literature
- US20210207279A1 ELECTROPLATING SYSTEMS AND METHODS Public/Granted day:2021-07-08
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