Invention Grant
- Patent Title: Substrate cleaning apparatus and substrate cleaning method
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Application No.: US17152870Application Date: 2021-01-20
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Publication No.: US11554389B2Publication Date: 2023-01-17
- Inventor: Akihiro Kubo , Yasushi Takiguchi , Teruhiko Kodama , Yoshiki Okamoto
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Pearne & Gordon LLP
- Priority: JPJP2020-007677 20200121
- Main IPC: B08B1/04
- IPC: B08B1/04 ; B08B11/02 ; B08B3/04 ; H01L21/02 ; H01L21/687 ; H01L21/67 ; B08B1/00
Abstract:
A substrate cleaning apparatus configured to clean a surface of a substrate having a circular shape by bringing a cleaning member into contact with the surface of the substrate and rotating the substrate and the cleaning member relatively is provided. A contact region of the cleaning member which comes into contact with the surface of the substrate is widened in a radial shape from a center side of the substrate toward a peripheral side thereof.
Public/Granted literature
- US20210220878A1 SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD Public/Granted day:2021-07-22
Information query
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