Invention Grant
- Patent Title: Power semiconductor diode including field stop region
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Application No.: US17466342Application Date: 2021-09-03
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Publication No.: US11569392B2Publication Date: 2023-01-31
- Inventor: Hans-Joachim Schulze , Christian Jaeger , Moriz Jelinek , Daniel Schloegl , Benedikt Stoib
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Priority: DE102020123847.9 20200914
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L29/06 ; H01L29/66 ; H01L21/265 ; H01L29/08 ; H01L29/36

Abstract:
A power semiconductor diode includes a semiconductor body having first and second main surfaces opposite to each other along a vertical direction. A drift region of a second conductivity type is arranged between an anode region of a first conductivity type and the second main surface. A field stop region of the second conductivity type is arranged between the drift region and the second main surface. A dopant concentration profile of the field stop region along the vertical direction includes a maximum peak. An injection region of the first conductivity type is arranged between the field stop region and the second main surface, with a pn-junction between the injection and field stop regions. A cathode contact region of the second conductivity type is arranged between the field stop region and the second main surface. A first vertical distance between the pn-junction and the maximum peak ranges from 200 nm to 1500 nm.
Public/Granted literature
- US20220085215A1 Power Semiconductor Diode Including Field Stop Region Public/Granted day:2022-03-17
Information query
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