Invention Grant
- Patent Title: Method for forming an extreme ultraviolet lithography pellicle
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Application No.: US17131297Application Date: 2020-12-22
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Publication No.: US11599019B2Publication Date: 2023-03-07
- Inventor: Marina Timmermans , Cedric Huyghebaert , Ivan Pollentier , Elie Schapmans , Emily Gallagher
- Applicant: IMEC VZW
- Applicant Address: BE Leuven
- Assignee: IMEC VZW
- Current Assignee: IMEC VZW
- Current Assignee Address: BE Leuven
- Agency: McDonnell Boehnen Hulbert & Berghoff LLP
- Priority: EP19219382 20191223
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/62

Abstract:
According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.
Public/Granted literature
- US20210191255A1 Method for Forming an Extreme Ultraviolet Lithography Pellicle Public/Granted day:2021-06-24
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