公开(公告)号：US11599019B2

公开(公告)日：2023-03-07

申请号：US17131297

申请日：2020-12-22

Applicant: IMEC VZW

Inventor： Marina Timmermans ,  Cedric Huyghebaert ,  Ivan Pollentier ,  Elie Schapmans ,  Emily Gallagher

IPC: G03F1/64 ,  G03F1/62

Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.

公开(公告)号：US20210320001A1

公开(公告)日：2021-10-14

申请号：US17225644

申请日：2021-04-08

Applicant: IMEC VZW

Inventor： Daire Cott ,  Elie Schapmans

IPC: H01L21/02

Abstract: A method for growing a dielectric material on a surface comprises introducing the surface into a first process chamber; in the first process chamber, exposing the surface to a first precursor, thereby adsorbing the first precursor to the surface; without purging the first process chamber, introducing the surface into a second process chamber; and in the second process chamber, exposing the surface to a second precursor thereby reacting the adsorbed first precursor with the second precursor to grow the dielectric material on the surface.

公开(公告)号：US20210191255A1

公开(公告)日：2021-06-24

申请号：US17131297

申请日：2020-12-22

Applicant: IMEC VZW

Inventor： Marina Timmermans ,  Cedric Huyghebaert ,  Ivan Pollentier ,  Elie Schapmans ,  Emily Gallagher

IPC: G03F1/64

Abstract: According to an aspect of the present disclosure there is provided a method for forming an EUVL pellicle, the method comprising: coating a carbon nanotube, CNT, membrane, and mounting the CNT membrane to a pellicle frame, wherein coating the CNT membrane comprises: pre-coating CNTs of the membrane with a seed material, and forming an outer coating on the pre-coated CNTs, the outer coating covering the pre-coated CNTs, the forming of the outer coating comprising depositing a coating material on the pre-coated CNTs by atomic layer deposition.