- 专利标题: Apparatus and method for controlling edge ring variation
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申请号: US17161271申请日: 2021-01-28
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公开(公告)号: US11668553B2公开(公告)日: 2023-06-06
- 发明人: Sathyendra Ghantasala , Leonid Dorf , Evgeny Kamenetskiy , Peter Muraoka , Denis M. Koosau , Rajinder Dhindsa , Andreas Schmid
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials Inc.
- 当前专利权人: Applied Materials Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Patterson & Sheridan LLP
- 代理商 Keith Taboada
- 主分类号: G01B7/06
- IPC分类号: G01B7/06 ; H01L21/67 ; H01J37/32 ; H01L21/687
摘要:
Disclosed herein is a method and apparatus for controlling surface characteristics by measuring capacitance of a process kit ring. The method includes interfacing a ring with a jig assembly for measuring capacitance in at least a first location of the ring. The ring has that includes a top surface, a bottom surface, and an inner surface opposite an outer surface. At least the bottom surface has an external coating placed thereon. The method further includes contacting a measuring device to the first location on the outer surface proximate the bottom surface. The measuring device contacts an opening in the external coating to the body. The measuring device contacts a first conductive member that is electrically coupled to the ring. A capacitance is measured on the measuring device. The capacitance across the top surface is measured.
公开/授权文献
- US20210254957A1 APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION 公开/授权日:2021-08-19
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