Methods and apparatus for examining a material are provided. One example method generally includes disposing the material in a dielectric contrast analysis structure, wherein the dielectric contrast analysis structure comprises a bulk dielectric substance and a plurality of receptacles in the bulk dielectric substance, wherein the material is disposed in one or more of the plurality of receptacles; exposing the dielectric contrast analysis structure to incident electromagnetic radiation; detecting resultant radiation from the exposed dielectric contrast analysis structure; and analyzing the detected resultant radiation to estimate at least one of a phase fraction and a phase distribution in the material. One example system generally includes an electromagnetic radiation source; a dielectric contrast analysis structure comprising a bulk dielectric substance and a plurality of receptacles in the bulk dielectric substance for receiving the material; and an electromagnetic radiation detector, wherein the analysis structure is between the radiation source and the detector.