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公开(公告)号：US12117323B2
公开(公告)日：2024-10-15
申请号：US18300978
申请日：2023-04-14
Inventor： Lang Feng , Stefan S. Natu , John J. Valenza, II
CPC classification number: G01F1/66 , G01F1/74 , G01N22/00 , G01N27/26 , G01N33/2823 , G01N2021/4173 , G01N21/85
Abstract: Systems for examining a material comprising: an electromagnetic radiation source; a dielectric contrast analysis structure comprising: a bulk dielectric substance; a plurality of receptacles in the bulk dielectric substance for receiving the material; and an electromagnetic radiation detector, wherein the dielectric contrast analysis structure is between the electromagnetic radiation source and the electromagnetic radiation detector. Wherein the plurality of receptacles are substantially parallel with one another and are disposed in a dielectric contrast analysis structure that is disposed in a pipe. Wherein the dielectric contrast analysis structure comprises: a bulk dielectric substance having a first end, a second end, and the plurality of receptacles disposed within the bulk dielectric substance, wherein a flow path of the material through the receptacles is from the first end of the bulk dielectric substance to the second end of the bulk dielectric substance.
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公开(公告)号：US11668593B2
公开(公告)日：2023-06-06
申请号：US16248973
申请日：2019-01-16
Inventor： Lang Feng , Stefan S. Natu , John J. Valenza, II
CPC classification number: G01F1/66 , G01F1/74 , G01N22/00 , G01N27/26 , G01N33/2823 , G01N21/85 , G01N2021/4173
Abstract: Methods and apparatus for examining a material are provided. One example method generally includes disposing the material in a dielectric contrast analysis structure, wherein the dielectric contrast analysis structure comprises a bulk dielectric substance and a plurality of receptacles in the bulk dielectric substance, wherein the material is disposed in one or more of the plurality of receptacles; exposing the dielectric contrast analysis structure to incident electromagnetic radiation; detecting resultant radiation from the exposed dielectric contrast analysis structure; and analyzing the detected resultant radiation to estimate at least one of a phase fraction and a phase distribution in the material. One example system generally includes an electromagnetic radiation source; a dielectric contrast analysis structure comprising a bulk dielectric substance and a plurality of receptacles in the bulk dielectric substance for receiving the material; and an electromagnetic radiation detector, wherein the analysis structure is between the radiation source and the detector.
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