- Patent Title: Photocurable coating composition for forming low refractive layer
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Application No.: US15762383Application Date: 2017-02-14
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Publication No.: US11680172B2Publication Date: 2023-06-20
- Inventor: Jin Seok Byun , Jae Young Kim , Boo Kyung Kim , Seok Hoon Jang , Yeong Rae Chang
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: Dentons US LLP
- Priority: KR 20160019945 2016.02.19 KR 20170019349 2017.02.13
- International Application: PCT/KR2017/001609 2017.02.14
- International Announcement: WO2017/142291A 2017.08.24
- Date entered country: 2018-03-22
- Main IPC: C09D5/00
- IPC: C09D5/00 ; C09D4/00 ; C09D7/40 ; C09D7/62 ; C08J7/04 ; G02B1/111 ; G02B1/14 ; G03F7/004 ; G03F7/027 ; G03F7/038 ; G03F7/075 ; C08J7/043 ; C08J7/044 ; C08J7/046 ; C08K9/00 ; G03F7/09 ; C08K3/36
Abstract:
The present invention relates to a photocurable coating composition for forming a low refractive layer, a method for preparing an antireflection film using the photocurable coating composition, and an anti-reflective film prepared by using the photocurable coating composition. According to the present invention, a low refractive layer is formed of a photocurable coating composition containing two or more types of photo-polymerizable compounds, a photoinitiator, surface-treated hollow inorganic nanoparticles, and surface-treated solid inorganic nanoparticles.
Public/Granted literature
- US20180265710A1 PHOTOCURABLE COATING COMPOSITION FOR FORMING LOW REFRACTIVE LAYER Public/Granted day:2018-09-20
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