- 专利标题: Arc lamp with forming gas for thermal processing systems
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申请号: US17533593申请日: 2021-11-23
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公开(公告)号: US11721539B2公开(公告)日: 2023-08-08
- 发明人: Michael X. Yang , Rolf Bremensdorfer , Dave Camm , Joseph Cibere , Dieter Hezler , Shawming Ma , Yun Yang
- 申请人: Mattson Technology, Inc. , Beijing E-Town Semiconductor Technology Co., Ltd.
- 申请人地址: US CA Fremont
- 专利权人: BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD.,MATTSON TECHNOLOGY, INC
- 当前专利权人: BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY CO., LTD.,MATTSON TECHNOLOGY, INC
- 当前专利权人地址: CN Beijing; US CA Fremont
- 代理机构: Dority & Manning, P.A.
- 主分类号: H01J61/073
- IPC分类号: H01J61/073 ; H01J61/86 ; H05H1/48 ; H01J61/52 ; H01J61/28
摘要:
Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
公开/授权文献
- US20220165561A1 Arc Lamp With Forming Gas For Thermal Processing Systems 公开/授权日:2022-05-26
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