Invention Grant
- Patent Title: Steam-assisted single substrate cleaning process and apparatus
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Application No.: US17141622Application Date: 2021-01-05
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Publication No.: US11728185B2Publication Date: 2023-08-15
- Inventor: Jianshe Tang , Wei Lu , Haosheng Wu , Taketo Sekine , Shou-Sung Chang , Hari N. Soundararajan , Chad Pollard
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02 ; B08B3/02 ; B08B3/08 ; B08B5/02 ; B08B3/12 ; H01L21/306
Abstract:
The present disclosure relates to a method and apparatus for cleaning a substrate. The method includes rotating a substrate disposed on a substrate support and spraying a front side of the substrate using steam through a front side nozzle assembly. A back side of the substrate is sprayed using steam through a back side dispenser assembly. A heated chemical is dispensed over the front side of the substrate.
Public/Granted literature
- US20220216074A1 STEAM-ASSISTED SINGLE SUBSTRATE CLEANING PROCESS AND APPARATUS Public/Granted day:2022-07-07
Information query
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