- Patent Title: Semiconductor storage device and method of manufacturing the same
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Application No.: US17850699Application Date: 2022-06-27
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Publication No.: US11751397B2Publication Date: 2023-09-05
- Inventor: Yuta Saito , Shinji Mori , Atsushi Takahashi , Toshiaki Yanase , Keiichi Sawa , Kazuhiro Matsuo , Hiroyuki Yamashita
- Applicant: KIOXIA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JP 19128985 2019.07.11
- The original application number of the division: US16809887 2020.03.05
- Main IPC: H10B43/27
- IPC: H10B43/27 ; H01L21/02 ; H01L29/04

Abstract:
In one embodiment, a semiconductor storage device includes a stacked body in which a plurality of conducting layers are stacked through a plurality of insulating layers in a first direction, a semiconductor layer penetrating the stacked body, extending in the first direction and including metal atoms, and a memory film including a first insulator, a charge storage layer and a second insulator that are provided between the stacked body and the semiconductor layer. The semiconductor layer surrounds a third insulator penetrating the stacked body and extending in the first direction, and at least one crystal grain in the semiconductor layer has a shape surrounding the third insulator.
Public/Granted literature
- US20220336492A1 SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2022-10-20
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