Invention Grant
- Patent Title: Metal structures, devices, and methods
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Application No.: US16015045Application Date: 2018-06-21
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Publication No.: US11769729B2Publication Date: 2023-09-26
- Inventor: Daniel J. Zierath , Michael McSwiney , Jason Farmer , Akm Shaestagir Chowdhury
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Akona IP
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L21/285 ; H01L21/768 ; H01L23/522 ; H01L25/065 ; C22C19/07 ; C23C16/02 ; C22C30/00 ; C23C16/06 ; C22C19/03 ; C23C16/04 ; C22C19/00
Abstract:
Provided herein are metal structures that may include a cobalt alloy, a nickel alloy, or nickel, as well as related devices and methods. The metal structures may be formed by chemical vapor deposition (CVD), and may include trace amounts of precursor materials used during the CVD process.
Public/Granted literature
- US20190393156A1 METAL STRUCTURES, DEVICES, AND METHODS Public/Granted day:2019-12-26
Information query
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