Invention Grant
- Patent Title: Magnetoresistive element and magnetic memory
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Application No.: US17043404Application Date: 2019-02-19
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Publication No.: US11770981B2Publication Date: 2023-09-26
- Inventor: Hiroaki Honjo , Tetsuo Endoh , Shoji Ikeda , Hideo Sato , Koichi Nishioka
- Applicant: TOHOKU UNIVERSITY
- Applicant Address: JP Sendai
- Assignee: TOHOKU UNIVERSITY
- Current Assignee: TOHOKU UNIVERSITY
- Current Assignee Address: JP Sendai
- Agency: Procopio, Cory, Hargreaves Savitch LLP
- Priority: JP 18070399 2018.03.30
- International Application: PCT/JP2019/006150 2019.02.19
- International Announcement: WO2019/187800A 2019.10.03
- Date entered country: 2020-12-18
- Main IPC: H10N50/80
- IPC: H10N50/80 ; H10B61/00 ; H10N50/85

Abstract:
Provided are a magnetoresistance effect element and a magnetic memory having a shape magnetic anisotropy and using a recording layer having an anti-parallel coupling.
A first magnetic layer (3) and a second magnetic layer (5) of the magnetoresistance effect element include a ferromagnetic substance, have a magnetization direction variable to the direction perpendicular to a film surface and are magnetically coupled in an anti-parallel direction, and a junction size D (nm), which is a length of the longest straight line on an end face perpendicular to the thickness direction of the first magnetic layer (3) and the second magnetic layer (5), a film thickness t1 (nm) of the first magnetic layer (3), and a film thickness t2 (nm) of the second magnetic layer (5) satisfy relationships D
A first magnetic layer (3) and a second magnetic layer (5) of the magnetoresistance effect element include a ferromagnetic substance, have a magnetization direction variable to the direction perpendicular to a film surface and are magnetically coupled in an anti-parallel direction, and a junction size D (nm), which is a length of the longest straight line on an end face perpendicular to the thickness direction of the first magnetic layer (3) and the second magnetic layer (5), a film thickness t1 (nm) of the first magnetic layer (3), and a film thickness t2 (nm) of the second magnetic layer (5) satisfy relationships D
Public/Granted literature
- US20210135094A1 MAGNETORESISTIVE ELEMENT AND MAGNETIC MEMORY Public/Granted day:2021-05-06
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