Invention Grant
- Patent Title: Perovskite film, precursor composition thereof, method for preparing the same, and semiconductor element including the same
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Application No.: US17121887Application Date: 2020-12-15
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Publication No.: US11778839B2Publication Date: 2023-10-03
- Inventor: Kuo-Wei Huang , Yung-Liang Tung , Jung-Pin Chiou , Pei-Ting Chiu , Shih-Hsiung Wu
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: AMIN, TUROCY & WATSON, LLP
- Priority: TW 9136344 2020.10.20
- Main IPC: H10K30/10
- IPC: H10K30/10 ; C01B13/18 ; H10K85/00

Abstract:
Provided is a perovskite film including crystal grains with a crystalline structure of [A][B][X]3.n[C], wherein [A], [B], [X], [C] and n are as defined in the specification.
The present disclosure further provides a precursor composition of perovskite film, method for producing of perovskite film, and semiconductor element including such films, as described above. With the optimal lattice arrangement, the perovskite film shows the effects of small surface roughness, and the semiconductor element thereof can thus achieve high efficiency and stability even with large area of film formation, thereby indeed having prospect of the application.
The present disclosure further provides a precursor composition of perovskite film, method for producing of perovskite film, and semiconductor element including such films, as described above. With the optimal lattice arrangement, the perovskite film shows the effects of small surface roughness, and the semiconductor element thereof can thus achieve high efficiency and stability even with large area of film formation, thereby indeed having prospect of the application.
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