- 专利标题: Substrate cleaning components and methods in a plating system
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申请号: US16370265申请日: 2019-03-29
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公开(公告)号: US11814744B2公开(公告)日: 2023-11-14
- 发明人: Nolan Zimmerman , Gregory J. Wilson , Andrew Anten , Richard W. Plavidal , Eric J. Bergman , Tricia Youngbull , Timothy Gale Stolt , Sam Lee
- 申请人: Applied Materials, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Kilpatrick Townsend & Stockton LLP
- 主分类号: C25D21/08
- IPC分类号: C25D21/08 ; C25D5/48 ; H01L21/02 ; C25D7/12 ; C25D17/00 ; H01L21/288
摘要:
Systems for cleaning electroplating system components may include an electroplating apparatus including a plating bath vessel. The electroplating apparatus may include a rinsing frame extending above the plating bath vessel. The rinsing frame may include a rim extending circumferentially about an upper surface of the plating bath vessel and defining a rinsing channel between the rim and the upper surface of the plating bath vessel. The electroplating apparatus may also include a rinsing assembly including a splash guard that is translatable from a recessed first position to a second position extending at least partially across an access to the plating bath vessel. The rinsing assembly may also include a fluid nozzle extending from the rinsing frame.
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