公开(公告)号：US11814744B2

公开(公告)日：2023-11-14

申请号：US16370265

申请日：2019-03-29

申请人： Applied Materials, Inc.

发明人： Nolan Zimmerman ,  Gregory J. Wilson ,  Andrew Anten ,  Richard W. Plavidal ,  Eric J. Bergman ,  Tricia Youngbull ,  Timothy Gale Stolt ,  Sam Lee

IPC分类号： C25D21/08 ,  C25D5/48 ,  H01L21/02 ,  C25D7/12 ,  C25D17/00 ,  H01L21/288

CPC分类号： C25D21/08 ,  C25D5/48 ,  C25D7/12 ,  C25D17/001 ,  H01L21/02068 ,  H01L21/2885

摘要： Systems for cleaning electroplating system components may include an electroplating apparatus including a plating bath vessel. The electroplating apparatus may include a rinsing frame extending above the plating bath vessel. The rinsing frame may include a rim extending circumferentially about an upper surface of the plating bath vessel and defining a rinsing channel between the rim and the upper surface of the plating bath vessel. The electroplating apparatus may also include a rinsing assembly including a splash guard that is translatable from a recessed first position to a second position extending at least partially across an access to the plating bath vessel. The rinsing assembly may also include a fluid nozzle extending from the rinsing frame.

公开(公告)号：US20190301049A1

公开(公告)日：2019-10-03

申请号：US16370265

申请日：2019-03-29

申请人： Applied Materials, Inc.

发明人： Nolan Zimmerman ,  Greg Wilson ,  Andrew Anten ,  Richard W. Plavidal ,  Eric J. Bergman ,  Tricia Youngbull ,  Timothy Gale Stolt ,  Sam Lee

IPC分类号： C25D21/08 ,  C25D5/48 ,  C25D7/12 ,  H01L21/02 ,  H01L21/288

摘要： Systems for cleaning electroplating system components may include an electroplating apparatus including a plating bath vessel. The electroplating apparatus may include a rinsing frame extending above the plating bath vessel. The rinsing frame may include a rim extending circumferentially about an upper surface of the plating bath vessel and defining a rinsing channel between the rim and the upper surface of the plating bath vessel. The electroplating apparatus may also include a rinsing assembly including a splash guard that is translatable from a recessed first position to a second position extending at least partially across an access to the plating bath vessel. The rinsing assembly may also include a fluid nozzle extending from the rinsing frame.

公开(公告)号：US20190321861A1

公开(公告)日：2019-10-24

申请号：US16386646

申请日：2019-04-17

申请人： Applied Materials, Inc.

发明人： Joseph A. Jonathan ,  Kyle M. Hanson ,  Jason Rye ,  James Brown ,  Greg Wilson ,  Eric J. Bergman ,  Tricia A. Youngbull ,  Timothy Gale Stolt

IPC分类号： B08B1/00 ,  C25D17/00

摘要： Systems for cleaning electroplating system components may include a seal cleaning assembly incorporated with an electroplating system. The seal cleaning assembly may include an arm pivotable between a first position and a second position. The arm may be rotatable about a central axis of the arm. The seal cleaning assembly may include a cleaning head coupled with a distal portion of the arm. The cleaning head may include a bracket having a faceplate coupled with the arm, and a housing extending from the faceplate. The housing may define one or more arcuate channels extending through the housing to a front surface of the bracket. The cleaning head may also include a rotatable cartridge extending from the housing of the bracket. The cartridge may include a mount cylinder defining one or more apertures configured to deliver a cleaning solution to a pad coupled about the mount cylinder.