- 专利标题: Semiconductor device including layers with different chalcogen compounds and semiconductor apparatus including the same
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申请号: US17244212申请日: 2021-04-29
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公开(公告)号: US11818899B2公开(公告)日: 2023-11-14
- 发明人: Wooyoung Yang , Bonwon Koo , Chungman Kim , Kwangmin Park , Hajun Sung , Dongho Ahn , Changseung Lee , Minwoo Choi
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Suwon-si
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR 20200145526 2020.11.03 KR 20210001064 2021.01.05
- 主分类号: H10B63/00
- IPC分类号: H10B63/00 ; G11C13/00 ; H10B61/00 ; H10N50/01 ; H10N50/80 ; H10N70/20 ; H10N70/00
摘要:
A chalcogen compound layer exhibiting ovonic threshold switching characteristics, a switching device, a semiconductor device, and/or a semiconductor apparatus including the same are provided. The switching device and/or the semiconductor device may include two or more chalcogen compound layers having different energy band gaps. Alternatively, the switching device and/or semiconductor device may include a chalcogen compound layer having a concentration gradient of an element of boron (B), aluminum (Al), scandium (Sc), manganese (Mn), strontium (Sr), and/or indium (In) in a thickness direction thereof. The switching device and/or a semiconductor device may exhibit stable switching characteristics while having a low off-current value (leakage current value).
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