Invention Grant
- Patent Title: Apparatus and method for treating substrate
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Application No.: US16925449Application Date: 2020-07-10
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Publication No.: US11862491B2Publication Date: 2024-01-02
- Inventor: Dohyeon Yoon , Joo Jib Park , Jin Se Park
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: Semes Co., Ltd.
- Current Assignee: Semes Co., Ltd.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20190083570 2019.07.11
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B7/00 ; H01L21/02 ; H01L21/677

Abstract:
An apparatus for treating a substrate includes a light treatment chamber having an interior space, a support unit that supports the substrate in the interior space, and an irradiation unit that irradiates light to the substrate in the interior space to remove organic matter remaining on the substrate, in which the irradiation unit includes a first light source that irradiates first light to the substrate and a second light source that irradiates, to the substrate, second light having a different wavelength range from the first light.
Public/Granted literature
- US20210013064A1 APPARATUS AND METHOD FOR TREATING SUBSTRATE Public/Granted day:2021-01-14
Information query
IPC分类: