公开(公告)号：US12057335B2

公开(公告)日：2024-08-06

申请号：US17957428

申请日：2022-09-30

Applicant: SEMES CO., LTD.

Inventor： Sang Min Lee ,  Jin Se Park ,  Ki Hoon Choi

IPC: G01N1/10 ,  G01N1/20 ,  H01L21/67 ,  H01L21/66

CPC classification number: H01L21/67253 ,  G01N1/10 ,  H01L21/67034

Abstract: Provided is a concentration measuring apparatus, which measures a concentration of a fluid under a high-pressure environment, such as an environment in which a supercritical fluid is provided. The concentration measuring apparatus includes: a concentration meter for measuring a concentration of a first fluid contained in a fluid in the measurement line; a sampling line for transferring a process fluid of a processing space in which a substrate is treated in a high-pressure environment to the measurement line; a control valve for opening and closing the sampling line; a fluid pressure regulator installed downstream the control valve in the sampling line and configured to adjust the passing fluid to a set pressure; and a decompression tank installed between the sampling line and the measurement line.

公开(公告)号：US11862491B2

公开(公告)日：2024-01-02

申请号：US16925449

申请日：2020-07-10

Applicant: SEMES CO., LTD.

Inventor： Dohyeon Yoon ,  Joo Jib Park ,  Jin Se Park

IPC: H01L21/67 ,  B08B7/00 ,  H01L21/02 ,  H01L21/677

CPC classification number: H01L21/67115 ,  B08B7/0021 ,  H01L21/02101 ,  H01L21/67034 ,  H01L21/67742

Abstract: An apparatus for treating a substrate includes a light treatment chamber having an interior space, a support unit that supports the substrate in the interior space, and an irradiation unit that irradiates light to the substrate in the interior space to remove organic matter remaining on the substrate, in which the irradiation unit includes a first light source that irradiates first light to the substrate and a second light source that irradiates, to the substrate, second light having a different wavelength range from the first light.