Salts and photoresists comprising same

Invention Grant

US11880134B2 Salts and photoresists comprising same 有权

Patent Title: Salts and photoresists comprising same
Application No.: US16204839

Application Date: 2018-11-29
Publication No.: US11880134B2

Publication Date: 2024-01-23
Inventor: Emad Aqad , James F. Cameron , James W. Thackeray
Applicant: Rohm and Haas Electronic Materials LLC
Applicant Address: US MA Marlborough
Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
Current Assignee Address: US MA Marlborough
Agency: CANTOR COLBURN LLP
Main IPC: G03F7/004
IPC: G03F7/004 ; G03F7/16 ; G03F7/20 ; G03F7/26 ; G03F7/039 ; C07C309/10 ; C07C309/19 ; C07C62/06 ; C07C309/12 ; C07C395/00 ; C07D517/00 ; C07C309/06 ; C07C309/16 ; C07D345/00

Abstract:

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

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IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/004	.感光材料（G03F7/12，G03F7/14优先）