公开(公告)号：US20100292505A1

公开(公告)日：2010-11-18

申请号：US12671055

申请日：2008-07-17

申请人： Julien Leveque ,  Nicolas Barbarin ,  Magali Palacio

发明人： Julien Leveque ,  Nicolas Barbarin ,  Magali Palacio

IPC分类号： C07C309/16

CPC分类号： C07C329/16 ,  C07C333/26

摘要： The present application relates to sulfanyl derivatives of formula (I) and to their use as synthesis intermediates, especially for the preparation of the pharmaceutically active compound mesna. Formula (I), wherein X is O or N—C(NH)NH2; M+ is hydrogen, sodium, disodium, potassium, dipotassium, ammonium (NH4)+, diammonium, quaternary ammonium, calcium or magnesium.

摘要翻译： 本申请涉及式（I）的硫烷基衍生物及其作为合成中间体的用途，特别是用于制备药学活性化合物美斯拉的用途。 式（I）其中X为O或N-C（NH）NH 2; M +是氢，钠，二钠，钾，二钾，铵（NH 4）+，二铵，季铵，钙或镁。

公开(公告)号：US09188858B2

公开(公告)日：2015-11-17

申请号：US13627208

申请日：2012-09-26

申请人： JSR CORPORATION

发明人： Yusuke Asano

IPC分类号： G03F7/004 ,  C07C309/19 ,  C07C309/12 ,  C07C381/12 ,  G03F7/20 ,  G03F7/039 ,  G03F7/11 ,  C07C309/07 ,  C07C309/16 ,  C07C309/17 ,  C07C309/65 ,  C07C317/12 ,  C07D295/185

CPC分类号： G03F7/0045 ,  C07C309/07 ,  C07C309/12 ,  C07C309/16 ,  C07C309/17 ,  C07C309/19 ,  C07C309/65 ,  C07C317/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D295/185 ,  C07D333/46 ,  C07D333/76 ,  C07D333/78 ,  C07D335/02 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041

摘要： A radiation-sensitive resin composition includes an acid generating agent to generate a compound represented by a following formula (1) by irradiation with a radioactive ray. In the formula (1), R1 represents a monovalent organic group having 1 to 20 carbon atoms. R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. The compound represented by the formula (1) is preferably a compound represented by a following formula (1-1). In the formula (1-1), R2 is as defined in the above formula (1). X represents an electron attractive group. R3 represents a monovalent organic group having 1 to 20 carbon atoms.

摘要翻译： 辐射敏感性树脂组合物包括通过放射线照射产生由下式（1）表示的化合物的酸产生剂。 式（1）中，R 1表示碳原子数为1〜20的1价有机基团。 R2表示氢原子或碳原子数1〜20的1价有机基团。 由式（1）表示的化合物优选为由下式（1-1）表示的化合物。 在式（1-1）中，R 2如上述式（1）中所定义。 X表示吸电子基团。 R3表示碳原子数1〜20的1价有机基团。

公开(公告)号：US4656270A

公开(公告)日：1987-04-07

申请号：US711948

申请日：1985-03-15

申请人： Cynthia A. Maryanoff ,  James N. Plampin ,  Robin C. Stanzione

发明人： Cynthia A. Maryanoff ,  James N. Plampin ,  Robin C. Stanzione

IPC分类号： C07D207/22 ,  B01J23/00 ,  C07B61/00 ,  C07C67/00 ,  C07C301/00 ,  C07C303/16 ,  C07C309/16 ,  C07C313/00 ,  C07C335/16 ,  C07C381/14 ,  C07D207/26 ,  C07D207/273 ,  C07D295/14 ,  C07D295/215 ,  C07D295/12 ,  C07D413/12

CPC分类号： C07D207/273 ,  C07C381/14 ,  C07D295/215

摘要： Novel synthetic steps and intermediates leading to guanidines such as the anti-diabetic compound linogliride. Included is a hydrogen peroxide oxidation of a thiourea (II) to a sulfonic acid (I) which may then be reacted with morpholine to form the carboximidamide (III): ##STR1##

摘要翻译： 新的合成步骤和中间体导致胍如抗糖尿病化合物林格列里。 包括硫脲（II）到磺酸（I）的过氧化氢氧化，然后其可以与吗啉反应以形成甲脒（III）：

公开(公告)号：US12060538B2

公开(公告)日：2024-08-13

申请号：US18045281

申请日：2022-10-10

申请人： PROMEGA CORPORATION

发明人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood ,  Harry Tetsuo Uyeda ,  Carolyn Woodroofe Hitko ,  Dieter Klaubert

IPC分类号： C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/14 ,  C11D1/28

CPC分类号： C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/143

摘要： The invention provides surfactant compounds of formulas I-IX, which can be used in methods for aiding the solubilization, digestion, preparation, analysis, and/or characterization of biological material, for example, proteins or cell membranes. The compounds can also aid in the recovery of peptides generated during protein digestion, particularly for in-gel digestion protocol. Additionally, the compounds can improve enzymatic protein deglycosylation without interfering with downstream sample preparation steps and mass spectrometric analysis. The compounds can be specifically useful as digestion aids that can be decomposed by an acid, by heat, or a combination thereof. Decomposition of the surfactants allows for facile separation from isolated samples, and/or allows for analysis of the sample without interfering with the sensitivity of various analytical techniques.

公开(公告)号：US11880134B2

公开(公告)日：2024-01-23

申请号：US16204839

申请日：2018-11-29

申请人： Rohm and Haas Electronic Materials LLC

发明人： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC分类号： G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  G03F7/039 ,  C07C309/10 ,  C07C309/19 ,  C07C62/06 ,  C07C309/12 ,  C07C395/00 ,  C07D517/00 ,  C07C309/06 ,  C07C309/16 ,  C07D345/00

CPC分类号： G03F7/0045 ,  C07C62/06 ,  C07C309/06 ,  C07C309/10 ,  C07C309/12 ,  C07C309/16 ,  C07C309/19 ,  C07C395/00 ,  C07D345/00 ,  C07D517/00 ,  G03F7/0042 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2004 ,  G03F7/26 ,  C07C2603/74

摘要： New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

公开(公告)号：US20190196326A1

公开(公告)日：2019-06-27

申请号：US16286984

申请日：2019-02-27

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Daisuke ASAKAWA ,  Akiyoshi GOTO ,  Keita KATO ,  Keiyu OU

IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C309/17 ,  C07C309/16 ,  C07C309/19 ,  C07C309/07 ,  C07C317/06 ,  C07C317/12 ,  C07D295/185 ,  G03F7/32

CPC分类号： G03F7/0045 ,  C07C309/07 ,  C07C309/16 ,  C07C309/17 ,  C07C309/19 ,  C07C317/06 ,  C07C317/12 ,  C07C2601/14 ,  C07C2603/74 ,  C07D295/185 ,  G03F7/004 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/32

摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid represented by Formula (I) by irradiation with an actinic ray or radiation, and a resin. The resist film is formed of the actinic ray-sensitive or radiation-sensitive resin composition. In the pattern forming method and the method of manufacturing an electronic device, the actinic ray-sensitive or radiation-sensitive resin composition is used.

公开(公告)号：US09816054B2

公开(公告)日：2017-11-14

申请号：US12249584

申请日：2008-10-10

申请人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood ,  Harry Tetsuo Uyeda ,  Carolyn Woodroofe Hitko ,  Dieter Klaubert

发明人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood ,  Harry Tetsuo Uyeda ,  Carolyn Woodroofe Hitko ,  Dieter Klaubert

IPC分类号： C07C309/64 ,  C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/14

CPC分类号： C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/143

摘要： The invention provides surfactant compounds of formulas I-IX, which can be used in methods for aiding the solubilization, digestion, preparation, analysis, and/or characterization of biological material, for example, proteins or cell membranes. The compounds can also aid in the recovery of peptides generated during protein digestion, particularly for in-gel digestion protocol. Additionally, the compounds can improve enzymatic protein deglycosylation without interfering with downstream sample preparation steps and mass spectrometric analysis. The compounds can be specifically useful as digestion aids that can be decomposed by an acid, by heat, or a combination thereof. Decomposition of the surfactants allows for facile separation from isolated samples, and/or allows for analysis of the sample without interfering with the sensitivity of various analytical techniques.

公开(公告)号：US11624041B2

公开(公告)日：2023-04-11

申请号：US16805333

申请日：2020-02-28

申请人： PROMEGA CORPORATION

发明人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood ,  Harry Tetsuo Uyeda ,  Carolyn Woodroofe Hitko ,  Dieter Klaubert

IPC分类号： C07C309/15 ,  C11D1/14 ,  C07D307/56 ,  C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D317/22 ,  C07D333/16

摘要： The invention provides surfactant compounds of formulas I-IX, which can be used in methods for aiding the solubilization, digestion, preparation, analysis, and/or characterization of biological material, for example, proteins or cell membranes. The compounds can also aid in the recovery of peptides generated during protein digestion, particularly for in-gel digestion protocol. Additionally, the compounds can improve enzymatic protein deglycosylation without interfering with downstream sample preparation steps and mass spectrometric analysis. The compounds can be specifically useful as digestion aids that can be decomposed by an acid, by heat, or a combination thereof. Decomposition of the surfactants allows for facile separation from isolated samples, and/or allows for analysis of the sample without interfering with the sensitivity of various analytical techniques.

公开(公告)号：US20180187127A1

公开(公告)日：2018-07-05

申请号：US15729406

申请日：2017-10-10

申请人： PROMEGA CORPORATION

发明人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood ,  Harry Tetsuo Uyeda ,  Carolyn Woodroofe Hitko ,  Dieter Klaubert

IPC分类号： C11D1/20 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C309/10 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/14 ,  C07C329/06

CPC分类号： C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/143

摘要： The invention provides surfactant compounds of formulas I-IX, which can be used in methods for aiding the solubilization, digestion, preparation, analysis, and/or characterization of biological material, for example, proteins or cell membranes. The compounds can also aid in the recovery of peptides generated during protein digestion, particularly for in-gel digestion protocol. Additionally, the compounds can improve enzymatic protein deglycosylation without interfering with downstream sample preparation steps and mass spectrometric analysis. The compounds can be specifically useful as digestion aids that can be decomposed by an acid, by heat, or a combination thereof. Decomposition of the surfactants allows for facile separation from isolated samples, and/or allows for analysis of the sample without interfering with the sensitivity of various analytical techniques.

公开(公告)号：US08993212B2

公开(公告)日：2015-03-31

申请号：US13879989

申请日：2011-10-14

申请人： Ryozo Takihana ,  Satoru Narizuka

发明人： Ryozo Takihana ,  Satoru Narizuka

IPC分类号： G03F7/004 ,  G03F7/38 ,  C07C303/32 ,  C07C309/06 ,  C07C309/16 ,  C07C309/19 ,  G03F7/027 ,  C07C309/12 ,  C07C309/10 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20

CPC分类号： G03F7/027 ,  C07C303/32 ,  C07C309/06 ,  C07C309/10 ,  C07C309/12 ,  C07C309/16 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

摘要： A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.

摘要翻译： 根据本发明的抗蚀剂组合物至少包括基础树脂，光致酸产生剂和溶剂，其中光酸产生剂包含以下通式（4）的含氟磺酸盐。 在该式中，X独立地表示氢原子或氟原子; n表示1〜6的整数， R1表示氢原子，或烷基，烯基，氧代烷基，芳基或芳烷基; R1中碳上的任何氢原子可以被取代基取代; R2代表RAO或RBRCN; A表示二价基团。 该含氟磺酸盐可以用作在抗蚀剂溶剂中具有高溶解度的光致酸产生剂，因此可以适当地用于抗蚀剂组合物，使得抗蚀剂组合物显示出高分辨率，宽DOF，小LER和高灵敏度以形成 光刻工艺中的良好图案形状。