公开(公告)号：US11448960B2

公开(公告)日：2022-09-20

申请号：US16205055

申请日：2018-11-29

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/16 ,  C07F11/00 ,  G03F7/027 ,  G03F7/039 ,  G03F7/20

Abstract: New Te-salts are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

公开(公告)号：US20190161509A1

公开(公告)日：2019-05-30

申请号：US16204960

申请日：2018-11-29

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James F. Cameron ,  James W. Thackeray

IPC: C07F11/00 ,  G03F7/16 ,  G03F7/004 ,  G03F7/027

Abstract: New Te-zwitterion compounds are provided, including photoactive tellurium salt compounds useful for Extreme Ultraviolet Lithography.

公开(公告)号：US20180362752A1

公开(公告)日：2018-12-20

申请号：US15623892

申请日：2017-06-15

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James W. Thackeray ,  James F. Cameron

IPC: C08L27/10 ,  C08L27/12 ,  C08L73/00 ,  C08L79/00 ,  C08L81/06 ,  C08L81/08 ,  G03F7/038 ,  G03F7/20

Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US10095109B1

公开(公告)日：2018-10-09

申请号：US15475630

申请日：2017-03-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Emad Aqad ,  James W. Thackeray

IPC: G03F7/004 ,  C07C69/54 ,  C08F220/28 ,  G03F7/038 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

公开(公告)号：US09957339B2

公开(公告)日：2018-05-01

申请号：US14820699

申请日：2015-08-07

Applicant: The University of Queensland ,  Rohm and Haas Electronic Materials LLC

Inventor： James W. Thackeray ,  Ke Du ,  Peter Trefonas, III ,  Idriss Blakey ,  Andrew Keith Whittaker

IPC: C08F220/28 ,  B05D1/00 ,  G03F7/20 ,  G03F7/09

CPC classification number: G01N21/6428 ,  A24B1/04 ,  A24B13/00 ,  A24B15/10 ,  B05D1/005 ,  B07C5/3427 ,  B07C5/366 ,  B07C2501/0018 ,  B65G27/00 ,  C08F220/28 ,  C08F2220/281 ,  C08F2438/03 ,  C10L1/003 ,  C10N2240/56 ,  G01N21/359 ,  G01N21/55 ,  G01N21/6486 ,  G01N21/84 ,  G01N21/85 ,  G01N21/94 ,  G01N21/95 ,  G01N21/952 ,  G01N2021/6417 ,  G01N2021/6439 ,  G01N2021/646 ,  G01N2021/8411 ,  G01N2021/845 ,  G01N2021/8466 ,  G01N2021/8592 ,  G03F7/091 ,  G03F7/094 ,  G03F7/20 ,  C08F2220/286 ,  C08F2220/185 ,  C08F220/22

Abstract: A copolymer is prepared by the polymerization of monomers that include an ultraviolet absorbing monomer, and a base-solubility-enhancing monomer. The copolymer is useful for forming a topcoat layer for electron beam and extreme ultraviolet lithographies. Also described are a layered article including the topcoat layer, and an associated method of forming an electronic device.

公开(公告)号：US20170261853A1

公开(公告)日：2017-09-14

申请号：US15604855

申请日：2017-05-25

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC ,  THE UNIVERSITY OF QUEENSLAND

Inventor： James W. Thackeray ,  Meiliana Siauw ,  Peter Trefonas, III ,  Idriss Blakey ,  Andrew Keith Whittaker

IPC: G03F7/09 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/038 ,  G03F7/004

CPC classification number: G03F7/09 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0047 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/094 ,  G03F7/162 ,  G03F7/20 ,  G03F7/2037 ,  G03F7/325

Abstract: A composite, which is a blend comprising: a nanoparticle comprising a core and a coating surrounding the core; and a polymer, wherein the coating of the nanoparticle comprises a ligand, wherein the ligand is a substituted or unsubstituted C1-C16 carboxylic acid or a salt thereof, a substituted or unsubstituted C1-C16 amino acid or a salt thereof, a substituted or unsubstituted C1-C16 dialkyl phosphonate, or a combination thereof; and wherein the polymer is a polymerization product of a photoacid generator comprising a polymerizable group; at least one unsaturated monomer, which is different from the photoacid generator comprising a polymerizable group; and a chain transfer agent of formula (I); wherein: Z is a y valent C1-20 organic group, x is 0 or 1, and Rd is a substituted or unsubstituted C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, or C7-20 aralkyl.

公开(公告)号：US09499513B2

公开(公告)日：2016-11-22

申请号：US14611768

申请日：2015-02-02

Applicant: Rohm and Haas Electronic Materials, LLC

Inventor： James F. Cameron ,  Vipul Jain ,  Paul J. Labeaume ,  Jin Wuk Sung ,  James W. Thackeray

IPC: G03F7/004 ,  C07D333/76 ,  G03F7/027 ,  G03F7/20 ,  C07C315/00 ,  C07D333/46 ,  C08F12/30 ,  C08F220/24 ,  G03F7/038 ,  G03F7/039 ,  C07C309/17 ,  G03F7/16 ,  G03F7/32

CPC classification number: C07D333/76 ,  C07C309/17 ,  C07C315/00 ,  C07C2603/86 ,  C07D333/46 ,  C08F12/30 ,  C08F220/24 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/32

Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

公开(公告)号：US09206276B2

公开(公告)日：2015-12-08

申请号：US14186371

申请日：2014-02-21

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Owendi Ongayi ,  James W. Thackeray ,  James F. Cameron

IPC: G03F7/039 ,  C08F22/10 ,  C08F22/14 ,  C08F220/10 ,  C08F220/30 ,  C08F220/32 ,  C08F220/36 ,  G03F7/004

CPC classification number: C08F220/10 ,  C08F220/30 ,  C08F220/32 ,  C08F220/36 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A copolymer includes the polymerized product of a comonomer and a monomer having the formula (I): wherein c is 0, 1, 2, 3, 4, or 5; Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently an unsubstituted or substituted C1-10 linear or branched alkyl group, an unsubstituted or substituted C3-10 cycloalkyl group, an unsubstituted or substituted C3-10 alkenylalkyl group, or an unsubstituted or substituted C3-10 alkynylalkyl group; wherein Rx and Ry together optionally form a ring; and Rz is a C6-20 aryl group substituted with an acetal-containing group or a ketal-containing group, or a C3-C20 heteroaryl group substituted with an acetal-containing group or a ketal-containing group, wherein the C6-20 aryl group or the C3-C20 heteroaryl group can, optionally, be further substituted. Also described are a photoresist including the copolymer, a coated substrate having a layer of the photoresist, and a method of forming an electronic device utilizing the photoresist.

Abstract translation: 共聚物包括共聚单体和具有式（I）的单体的聚合产物：其中c为0,1,2,3,4或5; R a是H，F，-CN，C 1-10烷基或C 1-10氟烷基; Rx和Ry各自独立地为未取代或取代的C 1-10直链或支链烷基，未取代或取代的C 3-10环烷基，未取代或取代的C 3-10链烯基烷基，或未取代或取代的C 3-10炔基烷基; 其中Rx和Ry一起可选地形成环; Rz是被含缩醛基团或含缩酮基团取代的C6-20芳基或被含缩醛基团或含缩酮基团取代的C3-C20杂芳基，其中C6-20芳基 基团或C 3 -C 20杂芳基可以任选地被进一步取代。 还描述了包括共聚物的光致抗蚀剂，具有光致抗蚀剂层的涂布基材，以及形成利用该光致抗蚀剂的电子器件的方法。

公开(公告)号：US20150177614A1

公开(公告)日：2015-06-25

申请号：US14527884

申请日：2014-10-30

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Owendi Ongayi ,  Vipul Jain ,  James F. Cameron ,  James W. Thackeray ,  Suzanne Coley

IPC: G03F7/038

CPC classification number: G03F7/038 ,  C08F220/30 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A copolymer includes repeat units derived from a lactone-substituted monomer, a base-soluble monomer having a pKa less than or equal to 12, a photoacid-generating monomer, and an acid-labile monomer having the formula wherein R1, R2, R3, and Ar are defined herein. The copolymer can be used as a component of a photoresist composition, and the photoresist composition can be coated on a substrate having one or more layers to be patterned, or used in a method of forming an electronic device.

Abstract translation: 共聚物包括衍生自内酯取代单体的重复单元，pKa小于或等于12的碱溶性单体，产生光酸的单体和具有下式的酸不稳定单体：其中R1，R2，R3， 和Ar。 共聚物可以用作光致抗蚀剂组合物的组分，并且光致抗蚀剂组合物可以涂覆在具有一层或多层待图案化的基材上，或者用于形成电子器件的方法中。

公开(公告)号：US11613519B2

公开(公告)日：2023-03-28

申请号：US15131135

申请日：2016-04-18

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Emad Aqad ,  James W. Thackeray ,  James F. Cameron

IPC: C07C309/17 ,  C07C309/06 ,  C07C309/07 ,  C07C309/12 ,  C07C309/20 ,  C07C309/23 ,  C07C309/42 ,  G03F7/004 ,  C08F224/00 ,  G03F7/039 ,  C07C303/32

Abstract: A monomer has the structure wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.