- 专利标题: Tuning capacitance to enhance FET stack voltage withstand
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申请号: US17190122申请日: 2021-03-02
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公开(公告)号: US11888468B2公开(公告)日: 2024-01-30
- 发明人: Robert Mark Englekirk
- 申请人: pSemi Corporation
- 申请人地址: US CA San Diego
- 专利权人: pSemi Corporation
- 当前专利权人: pSemi Corporation
- 当前专利权人地址: US CA San Diego
- 代理机构: JAQUEZ LAND GREENHAUS & McFARLAND LLP
- 代理商 Alessandro Steinfl, Esq.
- 分案原申请号: US15829773 2017.12.01
- 主分类号: H03K17/687
- IPC分类号: H03K17/687 ; H03K17/10 ; H03K17/693 ; H03K17/16 ; H01H11/00 ; H03K17/06
摘要:
An RF switch to controllably withstand an applied RF voltage Vsw, or a method of fabricating such a switch, which includes a string of series-connected constituent FETs with a node of the string between each pair of adjacent FETs. The method includes controlling capacitances between different nodes of the string to effectively tune the string capacitively, which will reduce the variance in the RF switch voltage distributed across each constituent FET, thereby enhancing switch breakdown voltage. Capacitances are controlled, for example, by disposing capacitive features between nodes of the string, and/or by varying design parameters of different constituent FETs. For each node, a sum of products of each significant capacitor by a proportion of Vsw appearing across it may be controlled to approximately zero.
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