Invention Grant
- Patent Title: Selective oxidation on rapid thermal processing (RTP) chamber with active steam generation
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Application No.: US17362760Application Date: 2021-06-29
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Publication No.: US11996305B2Publication Date: 2024-05-28
- Inventor: Chaitanya Anjaneyalu Prasad , Christopher Sean Olsen , Lara Hawrylchak , Erika Gabrielle Hansen , Daniel C. Glover , Naman Apurva , Tsung-Han Yang
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboa
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/02

Abstract:
Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.
Public/Granted literature
- US20220415676A1 SELECTIVE OXIDATION ON RAPID THERMAL PROCESSING (RTP) CHAMBER WITH ACTIVE STEAM GENERATION Public/Granted day:2022-12-29
Information query
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