公开(公告)号：US11996305B2

公开(公告)日：2024-05-28

申请号：US17362760

申请日：2021-06-29

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu Prasad ,  Christopher Sean Olsen ,  Lara Hawrylchak ,  Erika Gabrielle Hansen ,  Daniel C. Glover ,  Naman Apurva ,  Tsung-Han Yang

IPC: H01L21/67 ,  H01L21/02

CPC classification number: H01L21/67115 ,  H01L21/02238

Abstract: Embodiments of gas distribution modules for use with rapid thermal processing (RTP) systems and methods of use thereof are provided herein. In some embodiments, a gas distribution module for use with a RTP chamber includes: a first carrier gas line and a first liquid line fluidly coupled to a mixer, the mixer having one or more control valves configured to mix a carrier gas from the first carrier gas line and a liquid from the first liquid line in a desired ratio to form a first mixture; a vaporizer coupled to the mixer and configured to receive the first mixture in a hollow internal volume, the vaporizer having a heater configured to vaporize the first mixture; and a first gas delivery line disposed between the vaporizer and the RTP chamber to deliver the vaporized first mixture to the RTP chamber.

公开(公告)号：US20240282601A1

公开(公告)日：2024-08-22

申请号：US18653955

申请日：2024-05-02

Applicant: Applied Materials, Inc.

Inventor： Chaitanya Anjaneyalu Prasad ,  Christopher Sean Olsen ,  Lara Hawrylchak ,  Erika Gabrielle Hansen ,  Daniel C. Glover ,  Naman Apurva ,  Tsung-Han Yang

IPC: H01L21/67 ,  H01L21/02

CPC classification number: H01L21/67115 ,  H01L21/02238

Abstract: Embodiments of methods of performing a selective oxidation process on non-metal surfaces are provided herein. In some embodiments, a method of performing a selective oxidation process on non-metal surfaces includes: forming a first mixture of a carrier gas and a liquid in a mixer having a mixing block coupled to one or more control valves with a mixing line disposed therebetween; flowing the first mixture from the mixer to a vaporizer to vaporize the first mixture outside of an RTP chamber; and delivering the vaporized first mixture to the RTP chamber via a gas delivery line to expose a substrate disposed in the RTP chamber with the vaporized first mixture to perform a selective oxidation process on the substrate at a temperature of about 500 to about 1100 degrees Celsius.

公开(公告)号：US12165907B2

公开(公告)日：2024-12-10

申请号：US16952979

申请日：2020-11-19

Applicant: Applied Materials, Inc.

Inventor： Giridhar Kamesh ,  Vinodh Ramachandran ,  Chaitanya A. Prasad ,  Mohammad Aamir ,  Daniel C. Glover

IPC: H01L21/687 ,  H01L21/02 ,  H01L21/311

Abstract: Embodiments of the present disclosure generally relate to apparatus for substrate processing, and more specifically to apparatus for rotating substrates and to uses thereof. In an embodiment, an apparatus for rotating a substrate is provided. The apparatus includes a levitatable rotor comprising a plurality of magnets embedded therein, a plurality of gas bearings positioned to levitate the levitatable rotor, and a stator magnetically coupled to the levitatable rotor, the stator for producing a rotating magnetic field. Apparatus for processing a substrate with the apparatus for rotating substrates as well as methods of use are also described.