- 专利标题: Method for producing semiconductor wafers using a wire saw, wire saw, and semiconductor wafers made of monocrystalline silicon
-
申请号: US17414680申请日: 2019-12-12
-
公开(公告)号: US12083705B2公开(公告)日: 2024-09-10
- 发明人: Axel Beyer , Stefan Welsch
- 申请人: SILTRONIC AG
- 申请人地址: DE Munich
- 专利权人: SILTRONIC AG
- 当前专利权人: SILTRONIC AG
- 当前专利权人地址: DE Munich
- 代理机构: BROOKS KUSHMAN P.C.
- 优先权: DE 2018221922.2 2018.12.17
- 国际申请: PCT/EP2019/084802 2019.12.12
- 国际公布: WO2020/126787A 2020.05.25
- 进入国家日期: 2021-06-16
- 主分类号: B28D5/04
- IPC分类号: B28D5/04 ; B24B27/06 ; B28D5/00 ; H01L21/67 ; B23D59/00 ; B28D7/00 ; H01L21/02
摘要:
Semiconductor wafers are produced from a workpiece by means of a wire saw, by feeding the workpiece through an arrangement of wires tensioned between wire guide rollers and divided into wire groups, the wires moving in a running direction producing kerfs as wires engage the workpiece. For each of the wire groups, a placement error of the kerfs of the wire groups determined, and for each of the wire groups compensating movements of the wires of the wire group are induced as a function of the placement error, in a direction perpendicular to the running direction of the wires during feeding of the workpiece through the arrangement of wires, by activating at least one drive element.
信息查询