Invention Grant
- Patent Title: Semiconductor package and method for manufacturing the same
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Application No.: US18194792Application Date: 2023-04-03
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Publication No.: US12087668B2Publication Date: 2024-09-10
- Inventor: Hsien-Wei Chen , Jie Chen , Ming-Fa Chen
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Slater Matsil, LLP
- Main IPC: H01L29/40
- IPC: H01L29/40 ; H01L21/768 ; H01L23/00 ; H01L23/48

Abstract:
A semiconductor device includes a first passivation layer over a circuit and. conductive pad over the first passivation layer, wherein the conductive pad is electrically connected to the circuit. A second passivation layer is disposed over the conductive pad and the first passivation layer, and has a first opening and a second opening. The first opening exposes an upper surface of a layer that extends underneath the conductive pad, and the second opening exposes the conductive pad. A first insulating layer is disposed over the second passivation layer and filling the first and second openings. A through substrate via extends through the insulating layer, second passivation layer, passivation layer, and substrate. A side of the through substrate via and the second passivation layer have a gap that is filled with the first insulating layer. A conductive via extends through the first insulating layer and connecting to the conductive pad.
Public/Granted literature
- US20230238306A1 Semiconductor Package and Method for Manufacturing the Same Public/Granted day:2023-07-27
Information query
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