Semiconductor interconnect structure and method

    公开(公告)号:US12154876B2

    公开(公告)日:2024-11-26

    申请号:US17813865

    申请日:2022-07-20

    Abstract: A semiconductor device includes a first interconnect structure over first substrate, a first bonding layer over the first interconnect structure, multiple first bonding pads disposed in a first region of the first bonding layer, the first bonding pads having a first pitch, and multiple second bonding pads disposed in a second region of the first bonding layer, the second region extending between a first edge of the first bonding layer and the first region, the second bonding pads having the first pitch, the multiple second bonding pads including multiple pairs of adjacent second bonding pads, wherein the second bonding pads of each respective pair are connected by a first metal line.

    BONDING STRUCTURE AND METHOD OF FORMING SAME

    公开(公告)号:US20240379598A1

    公开(公告)日:2024-11-14

    申请号:US18784164

    申请日:2024-07-25

    Abstract: A package includes a first die that includes a first metallization layer, one or more first bond pad vias on the first metallization layer, wherein a first barrier layer extends across the first metallization layer between each first bond pad via and the first metallization layer, and one or more first bond pads on the one or more first bond pad vias, wherein a second barrier layer extends across each first bond pad via between a first bond pad and the first bond pad via, and a second die including one or more second bond pads, wherein a second bond pad is bonded to a first bond pad of the first die.

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