- Patent Title: Diode structures of stacked devices and methods of forming the same
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Application No.: US18366010Application Date: 2023-08-07
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Publication No.: US12094869B2Publication Date: 2024-09-17
- Inventor: Byounghak Hong , Seungchan Yun , Kang-ill Seo
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: Myers Bigel, P.A.
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L21/8238 ; H01L27/07 ; H01L29/739 ; H01L29/861

Abstract:
Diode structures of stacked devices and methods of forming the same are provided. Diode structures may include a substrate, an upper semiconductor layer that is spaced apart from the substrate in a vertical direction, an upper thin semiconductor layer protruding from a side surface of the upper semiconductor layer in a first horizontal direction, a lower semiconductor layer that is between the substrate and the upper semiconductor layer and has a first conductivity type, a lower thin semiconductor layer protruding from a side surface of the lower semiconductor layer in the first horizontal direction, a first diode contact that is electrically connected to the lower semiconductor layer, and a second diode contact that is electrically connected to one of the upper semiconductor layer and a portion of the substrate. The one of the upper semiconductor layer and the portion of the substrate may have a second conductivity type.
Public/Granted literature
- US20230378164A1 DIODE STRUCTURES OF STACKED DEVICES AND METHODS OF FORMING THE SAME Public/Granted day:2023-11-23
Information query
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