- 专利标题: Cathode mechanism of electron emission source, and method for manufacturing cathode mechanism of electron emission source
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申请号: US17938466申请日: 2022-10-06
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公开(公告)号: US12106928B2公开(公告)日: 2024-10-01
- 发明人: Ryoei Kobayashi
- 申请人: NuFlare Technology, Inc.
- 申请人地址: JP Yokohama
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Yokohama
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP 21174612 2021.10.26
- 主分类号: H01J37/065
- IPC分类号: H01J37/065 ; H01J9/04 ; H01J9/18 ; H01J37/075 ; H01J37/317
摘要:
A cathode mechanism of an electron emission source includes a crystal that includes an upper part being columnar, truncated conical, or their combined shape, and having a first surface to emit thermoelectrons, and a lower part, integrated with the upper part, having a second surface substantially parallel to the first surface, and a diameter larger than the maximum diameter of the upper part, a holding part that is a column having, in order from the holding part upper side, different inner diameters of a first diameter and a second diameter larger than the first one, and that holds the crystal in the state where the crystal first surface is projecting from the upper surface, and the crystal second surface contacts the holding part inside the column, and a retaining part that retains the crystal, at the back of the crystal lower part, not to be separated from the holding part.
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