Filament-less electron source
    4.
    发明授权

    公开(公告)号:US11887805B2

    公开(公告)日:2024-01-30

    申请号:US17491039

    申请日:2021-09-30

    Applicant: FEI Company

    CPC classification number: H01J37/075 H01J37/21 H01J2237/06316

    Abstract: Electron sources can include an electron source crystal coupled in series between opposing electrically conductive supports to form an electrically conductive path, wherein the electrical resistance of each of the electrically conductive supports is lower than the electrical resistance of the electron source crystal. Electron source crystals can include an emitting end and opposing shank end, wherein the shank end includes opposing leg portions. Electrically conductive supports can include foil supports spaced apart across a gap, wherein each of the opposing leg portions is attached to a respective foil support such that the foil supports are electrically connected to form the electrically conductive path. Particle focusing system are also disclosed. Electron sources can include an electron source crystal having an emitting end and opposing shank end, wherein the shank end is formed of a pair of opposing leg portions. Methods of manufacturing and operating electron sources are also disclosed.

    ELECTRON GUN CATHODE TECHNOLOGY
    5.
    发明公开

    公开(公告)号:US20230330751A1

    公开(公告)日:2023-10-19

    申请号:US17761864

    申请日:2020-09-23

    Applicant: Freemelt AB

    CPC classification number: B22F12/41 B33Y30/00 H01J37/075 H01J37/305

    Abstract: A metal 3D printer, a cathode holder system, a carrier for an electron emitter, and an electron source piece with a thermal break in a mechanical interface are provided. The metal 3D printer has an electron gun adapted to direct an electron beam generated by a back heated electron emitter of a cathode arrangement onto a metal material via an anode arrangement. The back heated electron emitter is capable of emitting electrons via thermionic emission from an emitting surface when heated on a back surface, and includes a side surface, essentially perpendicular to the emitting surface, between the emitting surface and the back surface. The metal 3D printer 100 includes: an electron source piece, including the electron emitter attached to a carrier in such a way that the carrier covers the side surface of the electron emitter adjoining the emitting surface; a cathode holder system including one or more cathode holder system members adapted to hold the electron source piece in a position in relation to an anode arrangement; and a first thermal break in a first mechanical interface adapted to mate an emitter holder of the cathode holder system with the electron source piece.

    FILAMENT-LESS ELECTRON SOURCE
    6.
    发明申请

    公开(公告)号:US20230101787A1

    公开(公告)日:2023-03-30

    申请号:US17491039

    申请日:2021-09-30

    Applicant: FEI Company

    Abstract: Electron sources can include an electron source crystal coupled in series between opposing electrically conductive supports to form an electrically conductive path, wherein the electrical resistance of each of the electrically conductive supports is lower than the electrical resistance of the electron source crystal. Electron source crystals can include an emitting end and opposing shank end, wherein the shank end includes opposing leg portions. Electrically conductive supports can include foil supports spaced apart across a gap, wherein each of the opposing leg portions is attached to a respective foil support such that the foil supports are electrically connected to form the electrically conductive path. Particle focusing system are also disclosed. Electron sources can include an electron source crystal having an emitting end and opposing shank end, wherein the shank end is formed of a pair of opposing leg portions. Methods of manufacturing and operating electron sources are also disclosed.

    PARTICLE BEAM GUN CONTROL SYSTEMS AND METHODS

    公开(公告)号:US20230040534A1

    公开(公告)日:2023-02-09

    申请号:US17970410

    申请日:2022-10-20

    Abstract: Presented systems and methods facilitate efficient and effective monitoring of particle beams. In some embodiments, a radiation gun system comprises: a particle beam gun that generates a particle beam, and a gun control component that controls the gun particle beam generation characteristics, including particle beam fidelity characteristics. The particle beam characteristics can be compatible with FLASH radiation therapy. Resolution control of the particle beam generation can enable dose delivery at an intra-pulse level and micro-bunch level. The micro-bunch can include individual bunches per each 3 GHz RF cycle within the 5 to 15 μsec pulse-width. The FLASH radiation therapy dose delivery can have a bunch level resolution of approximately 4.4×10{circumflex over ( )}-6 cGy/bunch.

    Charged particle beam source
    8.
    发明授权

    公开(公告)号:US11380511B2

    公开(公告)日:2022-07-05

    申请号:US16828571

    申请日:2020-03-24

    Applicant: FEI Company

    Abstract: A charged particle beam source, such as for use in an electron microscope, can include an electrically conductive support member coupled to a base, a mounting member coupled to the support member and defining a bore, and an emitter member received in the bore and retained by a fixative material layer flowed around the emitter member in the bore.

    ELECTRON BEAM APPLICATION DEVICE, AND ELECTRON BEAM EMISSION METHOD FOR ELECTRON BEAM APPLICATION DEVICE

    公开(公告)号:US20220199350A1

    公开(公告)日:2022-06-23

    申请号:US17604373

    申请日:2020-10-13

    Abstract: An object is to provide an electron beam applicator suitable for an electron gun having a photocathode and an electron beam emission method in the electron beam applicator. The object can be achieved by an electron beam applicator including: an electron gun section; a main body section; and a control unit. The electron gun section includes a light source, a photocathode that emits an electron beam in response to receiving excitation light emitted from the light source, and an anode. The main body section includes an objective lens that converges an electron beam emitted from the electron gun section. The control unit controls at least convergence power of the objective lens in accordance with a size of an electron beam emitted from the photocathode.

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