Invention Grant
- Patent Title: Apparatus for processing substrate and method of determining whether substrate treatment process is normal
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Application No.: US17474469Application Date: 2021-09-14
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Publication No.: US12112960B2Publication Date: 2024-10-08
- Inventor: Ohyeol Kwon , Soo Yeon Shin , Hyun Hoo Kim , Myung Chan Cho
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Cheonan-si
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Cheonan-si
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR 20200120202 2020.09.18
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06N3/045 ; H01L21/67

Abstract:
The inventive concept provides a method to determine whether a substrate treatment process is normal using a deep learning model. The method comprising receiving input on a substrate treatment process video, preprocessing the inputted video, using the deep learning model to study a preprocessed video, and determining whether the substrate treatment process is normal by comparing the trained model and a real time substrate treatment process video.
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