公开(公告)号：US12112960B2

公开(公告)日：2024-10-08

申请号：US17474469

申请日：2021-09-14

Applicant: SEMES CO., LTD.

Inventor： Ohyeol Kwon ,  Soo Yeon Shin ,  Hyun Hoo Kim ,  Myung Chan Cho

IPC: G06T7/00 ,  G06N3/045 ,  H01L21/67

CPC classification number: H01L21/67253 ,  G06N3/045 ,  G06T7/0004 ,  G06T2207/20081 ,  G06T2207/20084 ,  G06T2207/30148

Abstract: The inventive concept provides a method to determine whether a substrate treatment process is normal using a deep learning model. The method comprising receiving input on a substrate treatment process video, preprocessing the inputted video, using the deep learning model to study a preprocessed video, and determining whether the substrate treatment process is normal by comparing the trained model and a real time substrate treatment process video.

公开(公告)号：US12094706B2

公开(公告)日：2024-09-17

申请号：US17901904

申请日：2022-09-02

Applicant: SEMES CO., LTD.

Inventor： Myung Chan Cho

IPC: H01L21/02 ,  H01L21/67

CPC classification number: H01L21/02101 ,  H01L21/67023 ,  H01L21/67109 ,  H01L21/67248

Abstract: Provided is a substrate treating method. The substrate treating method includes: a first supercritical processing operation of loading a first substrate into a supercritical chamber and supercritically processing the first substrate in the supercritical chamber; a resting operation of maintaining the supercritical chamber in an empty state for a first time until a temperature in the supercritical chamber becomes a preset temperature by opening the supercritical chamber after the first substrate is unloaded from the supercritical chamber; and a second supercritical processing operation of loading a second substrate into the supercritical chamber and supercritically processing the second substrate in the supercritical chamber.