Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US18213304Application Date: 2023-06-23
-
Publication No.: US12136683B2Publication Date: 2024-11-05
- Inventor: Meng-Yang Chen , Yuan-Ting Lin
- Applicant: EPISTAR CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: EPISTAR CORPORATION
- Current Assignee: EPISTAR CORPORATION
- Current Assignee Address: TW Hsinchu
- Agency: Marquez IP Law Office, PLLC
- Agent Juan Carlos A. Marquez
- Priority: TW109114480 20200430
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/04 ; H01L33/10 ; H01L33/30 ; H01L33/62

Abstract:
A semiconductor device is provided, which includes an active structure, a first semiconductor layer, a second semiconductor layer, an intermediate layer, a transition layer and a contact layer. The active structure has two sides and includes an active region. The first semiconductor layer and the second semiconductor layer respectively located on the two sides of the active structure. The intermediate layer is located between the second semiconductor layer and the active structure. The transition layer is located on the second semiconductor layer. The contact layer is located on the transition layer.
Public/Granted literature
- US20230335669A1 SEMICONDUCTOR DEVICE Public/Granted day:2023-10-19
Information query
IPC分类: