Invention Grant
- Patent Title: Extended via semiconductor structure and device
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Application No.: US18180079Application Date: 2023-03-07
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Publication No.: US12199033B2Publication Date: 2025-01-14
- Inventor: Hung Hsun Lin , Wei-Chun Hua , Wen-Chu Huang , Yen-Yu Chen , Che-Chih Hsu , Chinyu Su , Wen Han Hung
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L21/027 ; H01L21/768 ; H01L23/522 ; H01L23/64 ; H01L23/66 ; H01L49/02

Abstract:
A device includes a substrate, a first conductive layer on the substrate, a first conductive via, and further conductive layers and conductive vias between the first conductive via and the substrate. The first conductive via is between the substrate and the first conductive layer, and is electrically connected to the first conductive layer. The first conductive via extends through at least two dielectric layers, and has thickness greater than about 8 kilo-Angstroms. An inductor having high quality factor is formed in the first conductive layer and also includes the first conductive via.
Public/Granted literature
- US20230223335A1 EXTENDED VIA SEMICONDUCTOR STRUCTURE, DEVICE AND METHOD Public/Granted day:2023-07-13
Information query
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