Invention Grant
- Patent Title: Magnetoresistance effect element and Heusler alloy
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Application No.: US18240657Application Date: 2023-08-31
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Publication No.: US12217775B2Publication Date: 2025-02-04
- Inventor: Kazuumi Inubushi , Katsuyuki Nakada , Tetsuya Uemura
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2019-146630 20190808,JP2020-041353 20200310
- Main IPC: G11B5/39
- IPC: G11B5/39 ; G01R33/09 ; G11C11/16 ; H01F10/193 ; H01F10/32 ; H10B61/00 ; H10N50/85

Abstract:
A magnetoresistance effect element includes a first ferromagnetic layer, a second ferromagnetic layer, and a non-magnetic layer positioned between the first ferromagnetic layer and the second ferromagnetic layer, and at least one of the first ferromagnetic layer and the second ferromagnetic layer is a Heusler alloy represented by the following General Formula (1): Co2FeαXβ (1) (in Formula (1), X represents one or more elements selected from the group consisting of Mn, Cr, Si, Al, Ga and Ge, and α and β represent numbers that satisfy 2.3≤α+β, α
Public/Granted literature
- US20240062777A1 MAGNETORESISTANCE EFFECT ELEMENT AND HEUSLER ALLOY Public/Granted day:2024-02-22
Information query
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