Invention Grant
- Patent Title: Apparatus and method for processing substrate
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Application No.: US17945089Application Date: 2022-09-15
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Publication No.: US12291029B2Publication Date: 2025-05-06
- Inventor: Sung Ho Kim , Bo Yeon Hwang , Chang Jin Moon , Sol Min Park , Sang Seok Kim
- Applicant: SEMES CO., LTD.
- Applicant Address: KR Chungcheongnam-do
- Assignee: SEMES CO., LTD.
- Current Assignee: SEMES CO., LTD.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: WOMBLE BOND DICKINSON (US) LLP
- Priority: KR10-2021-0193150 20211230,KR10-2022-0014342 20220203
- Main IPC: B41J2/04
- IPC: B41J2/04 ; B41J2/045 ; B41M3/00 ; B41M5/00

Abstract:
The present disclosure provides a method for processing a substrate that can maintain a production amount even when a production model is changed. The method for processing a substrate comprises: disposing the substrate on a levitation stage; measuring a distance between the substrate and an inkjet head module; and changing a discharging speed of ink to be discharged from the inkjet head module based on the measured distance.
Public/Granted literature
- US20230211601A1 APPARATUS AND METHOD FOR PROCESSING SUBSTRATE Public/Granted day:2023-07-06
Information query
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