公开(公告)号：US12291029B2

公开(公告)日：2025-05-06

申请号：US17945089

申请日：2022-09-15

Applicant: SEMES CO., LTD.

Inventor： Sung Ho Kim ,  Bo Yeon Hwang ,  Chang Jin Moon ,  Sol Min Park ,  Sang Seok Kim

IPC: B41J2/04 ,  B41J2/045 ,  B41M3/00 ,  B41M5/00

Abstract: The present disclosure provides a method for processing a substrate that can maintain a production amount even when a production model is changed. The method for processing a substrate comprises: disposing the substrate on a levitation stage; measuring a distance between the substrate and an inkjet head module; and changing a discharging speed of ink to be discharged from the inkjet head module based on the measured distance.