发明申请
US20030006008A1 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
失效
在磁场增强等离子体反应器中提供均匀等离子体的方法和装置
- 专利标题： Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor
- 专利标题（中）： 在磁场增强等离子体反应器中提供均匀等离子体的方法和装置
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申请号： US10205870申请日： 2002-07-26
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公开(公告)号： US20030006008A1公开(公告)日： 2003-01-09
- 发明人: Keiji Horioka , Chun Yan , Taeho Shin , Roger Alan Lindley , Panyin Hughes , Douglas H. Burns , Evans Y. Lee , Bryan Y. Pu , Qi Li , Mahmoud Dahimene
- 申请人： Applied Materials, Inc.
- 申请人地址： null
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： null
- 优先权： JP2001-335364 20011031; JP2001-206905 20010706
- 主分类号： C23F001/00
- IPC分类号： C23F001/00 ; H01L021/306 ; C23C016/00
摘要：
A method and apparatus for controlling a magnetic field gradient within a magnetically enhanced plasma reactor. The apparatus comprises a cathode pedestal supporting a wafer within an enclosure, a plurality of electromagnets positioned proximate the enclosure for producing a magnetic field in the enclosure and a magnetic field control element, positioned proximate the electromagnets, for controlling the magnetic field proximate a specific region of the wafer.
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