Invention Application
- Patent Title: Organic device including semiconducting layer aligned according to microgrooves of photoresist layer
- Patent Title (中): 有机器件包括根据光致抗蚀剂层的微槽对准的半导体层
-
Application No.: US10864775Application Date: 2004-06-09
-
Publication No.: US20040222415A1Publication Date: 2004-11-11
- Inventor: Wei-Yang Chou , Horng-Long Cheng , Chih-Ming Lai , Chi-Chang Liao
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW HSINCHU
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW HSINCHU
- Priority: TWTW92105172 20030311
- Main IPC: H01L035/24
- IPC: H01L035/24

Abstract:
An organic device including a substrate or a dielectric layer; a photoresist layer formed on the substrate or dielectric layer, wherein the photoresist layer is provided with a plurality of microgrooves having an alignment direction; an organic semiconducting layer having alignment formed on the photoresist layer, wherein the organic semiconducting layer aligns according to the alignment direction of the microgrooves of the photoresist layer; and an electrode.
Public/Granted literature
- US06867117B2 Organic device including semiconducting layer aligned according to microgrooves of photoresist layer Public/Granted day:2005-03-15
Information query